
Prizes:
1st Prize:₹5000 + Trophy
Runner up:₹3000 + Trophy
Apti Winner:₹2000
Registration Fee:
₹ 120 for individual participation
The event "Beyond Resume 2.0" is designed to help the participants enhance their overall campus skills and prepare them for job interviews. Participating in this event will give candidates the chance to boost their confidence and gain insights that will help them succeed in their future interviews, ultimately leading them to their dream job.
Stage 1: Aptitude Test
Candidates should arrive at the test center at least 30 minutes before the start time.
They should bring a valid photo ID card and a pen/pencil for the test.
Candidates should not bring any electronic devices, including mobile phones, calculators, or smart watches, to the test center.
Candidates should follow the instructions given by the event volunteers during the test.
Candidates are not allowed to leave the test center until the test is over.
Any act of cheating or misconduct during the test will result in
disqualification.
Stage 2: HR Interview Round
Candidates should arrive at the interview venue at least 15 minutes before their scheduled interview time.
They should dress professionally and bring their resume and relevant documents.
Candidates should not bring any electronic devices or notes to the interview.
They should be respectful and courteous to the interviewer and other
participants in group discussion round and one on one interview round.
Candidates should answer the questions truthfully and to the best of their knowledge.
Any act of cheating or misrepresentation during the interview will result in disqualification.
1. The first round is called "Idea Spark," where candidates must give the prsentation of their ideas infront of Judges.
2. Students chosen from the first round will be allowed to compete in the second stage, "Question battling," where they will have to respond to the Judge's questions.
3. judges deciion will be final.
4. Entries will be accepted as maximum 3 candidates in one group.
5. Only new ideas permitted and no plagarism.